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Reactive-ion etching
Results: 96

#	Item
61	Fraunhofer IMS F RAU N HOF E R I NST I T U T E F O R M IC RO E L EC T RO N I C C I RCU I T S A N D SYS T E MS I MS Add to Reading List Source URL: www.ims.fraunhofer.de Language: English - Date: 2014-02-15 05:02:23 Technology Microelectromechanical systems Etching Wafer Photoresist Stepper Deep reactive-ion etching Cleanroom Applied Materials Semiconductor device fabrication Materials science Microtechnology
62	MIMOS Semiconductor Training – Detail Training Content No Type Add to Reading List Source URL: semicon.mimos.my Language: English - Date: 2013-06-12 03:17:26 Science Etching Reactive-ion etching MIMOS Photolithography Statistical process control Wafer fabrication Wafer testing Metrology Semiconductor device fabrication Technology Materials science
63	Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2012-11-20 13:15:45 Microtechnology Microelectromechanical systems Wafer Chemical vapor deposition Deep reactive-ion etching Stepper Reactive-ion etching Plasma etcher Sputtering Semiconductor device fabrication Materials science Technology
64	Concept Demonstration of Dopant Selective Reactive Etching in Silicon Carbide Investigator(s): Dr. Robert S. Okojie (PI)/RHS at NASA GRC, Dorothy Lukco/Vantage Partners, LLC. At NASA GRC, and Laura Evans/RXS at NASA GRC Add to Reading List Source URL: nari.arc.nasa.gov Language: English - Date: 2014-10-17 18:20:41 Technology Microtechnology Ceramic materials Etching Silicon carbide Reactive-ion etching Doping Sulfur hexafluoride Microelectromechanical systems Semiconductor device fabrication Materials science Chemistry
65	NASA Aeronautics Research Institute Concept Demonstration of Dopant Selective Reactive Etching (DSRIE) in Silicon Carbide Robert S. Okojie, PhD Add to Reading List Source URL: nari.arc.nasa.gov Language: English - Date: 2014-10-17 18:19:56 Technology Microtechnology Etching Reactive-ion etching NASA Silicon carbide Materials science Semiconductor device fabrication Chemistry
66	Analytical Techniques for Trace Elemental Analyses on Wafer Surfaces for Monitoring and Controlling Contamination J. Wang, M. K. Balazs Balazs Analytical Laboratory, Sunnyvale, CA[removed]P. Pianetta, K. Baur and S. Brenna Add to Reading List Source URL: www-project.slac.stanford.edu Language: English - Date: 2003-04-14 02:31:05 Materials science Microtechnology Vapour phase decomposition Wafer X-ray fluorescence Photolithography Thermal oxidation Inductively coupled plasma mass spectrometry Deep reactive-ion etching Semiconductor device fabrication Chemistry Science
67	1– 6 February Technical Summaries www.spie.org/pw Conferences and Courses Add to Reading List Source URL: spie.org Language: English - Date: 2014-10-28 11:09:21 Technology Microelectromechanical systems Microfabrication Micro-Opto-Electro-Mechanical Systems Deep reactive-ion etching Etching Photolithography Graphene Bulk micromachining Materials science Microtechnology Semiconductor device fabrication
68	Unaxis 790 Series RIE Metal Fluorine Plasma Processing System Users Manual Coral name: Model: Add to Reading List Source URL: www.nist.gov Language: English - Date: 2013-01-18 08:44:58 Pump Double-click GUI widget Elevator Plasma etching System software Software Technology Semiconductor device fabrication Plasma processing Reactive-ion etching
69	Nanoscale Strength Measurements and Standards Objective Impact and Customers • The MEMS industry currently generates revenues of about $45B/year, dominated by two non-contact devices: inkjet Add to Reading List Source URL: www.nist.gov Language: English - Date: 2012-10-04 11:43:10 Semiconductor device fabrication Glass physics Nanotechnology Etching Microelectromechanical systems Deep reactive-ion etching Nanoelectromechanical system Fracture Focused ion beam Materials science Chemistry Microtechnology
70	GENESIS CONCENTRATOR TARGET PARTICLE CONTAMINATION MAPPING AND MATERIAL IDENTIFICATION Michael J. Calaway 1, Melissa C. Rodriguez 2, and Judith H. Allton[removed]Jacobs (ESCG) at NASA Johnson Space Center, Houston, TX (2) Add to Reading List Source URL: curator.jsc.nasa.gov Language: English - Date: 2013-09-16 21:16:11 Manufacturing 10 micrometres Wafer Microsphere Deep reactive-ion etching Particle size Silicon carbide Nanoparticle Chemistry Materials science Semiconductor device fabrication

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